Issue 10, 2025

First-principles study of Ga2Ge2S3Se3 monolayer: a promising photocatalyst for water splitting

Abstract

Recently, the quaternary Janus monolayers with the formula A2B2X3Y3 have been shown to be promising candidates for optoelectronic applications, especially in the photocatalytic water splitting reaction. Therefore, first-principles calculations were employed to investigate the photocatalytic properties of Ga2Ge2X3Y3 (X and Y represent S, Se or Te atoms) monolayers. The Ga2Ge2S3Se3 and Ga2Ge2Se3Te3 monolayers exhibit dynamic and thermal stability, supported by high cohesive energies (3.78–4.20 eV) and positive phonon dispersion. With a moderate Young's modulus (50.02–65.31 N m−1) and high Poisson's ratio (0.39–0.41), these monolayers offer a balance of stiffness and flexibility, making them suitable for flexible electronic applications. Especially, the difference in work function of 0.27 eV induces an intrinsic electric field in the Ga2Ge2S3Se3 monolayer, making the electronic structure of this material be suitable for the photocatalytic water splitting process. With light irradiation, the oxygen evolution reaction (OER) happened simultaneously, producing electrons and H+ protons for the hydrogen evolution reaction (HER) to happen at a low potential barrier. Moreover, the Ga2Ge2S3Se3 monolayer has a high absorption rate α(ω) of 105–106 cm−1 and a high electron mobility of 430.82–461.50 cm2 V−1 s−1. These characteristics result in a good solar-to-hydrogen Image ID:d5ra00812c-t1.gif of the Ga2Ge2S3Se3 monolayer (14.80%) which is promising for use in photon-driven water splitting.

Graphical abstract: First-principles study of Ga2Ge2S3Se3 monolayer: a promising photocatalyst for water splitting

Supplementary files

Article information

Article type
Paper
Submitted
03 Feb 2025
Accepted
09 Mar 2025
First published
17 Mar 2025
This article is Open Access
Creative Commons BY-NC license

RSC Adv., 2025,15, 8060-8071

First-principles study of Ga2Ge2S3Se3 monolayer: a promising photocatalyst for water splitting

P. D. Trung and H. D. Tong, RSC Adv., 2025, 15, 8060 DOI: 10.1039/D5RA00812C

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