Synergistic activating effects of a strong Lewis acid (metal ion) and a strong Brønsted acid enable KMnO4 to oxidize CH4 at room temperature

Abstract

The search for reagents that can oxidize methane (CH4) under mild conditions has long been a challenge for chemists. In this work, we report the synergistic effects of a strong Lewis acid Sc(OTf)3 and a strong Brønsted acid CF3CO2H (TFA) to activate KMnO4 towards the oxidation of CH4 at room temperature. KMnO4 in the presence of 0.5–2 mol equiv. of Sc(OTf)3 in TFA/TFAA (1 : 4 by vol., TFAA = trifluoroacetic anhydride) is able to oxidize CH4 (30 atm) at 22 °C to produce methyl trifluoroacetate (CF3CO2CH3) in 17 ± 2% yield (based on KMnO4). The yield increases to 34% when the temperature is raised to 40 °C. No product is observed when using Sc(OTf)3 alone, and only 2% of methyl trifluoroacetate is produced using TFA alone. A kinetic isotope effect of 2.2 is found when using a mixture of CH4 and CD4 as the substrate. The use of BrCCl3 as a radical trap results in the formation of BrCH3, indicating that the CH3˙ radical is an intermediate in CH4 oxidation. These results suggest that Sc(OTf)3 and TFA form an active intermediate with MnO4, which undergoes hydrogen-atom abstraction (HAT) from CH4 to produce CH3˙, which is further oxidized to CH3OH. Further oxidation of CH3OH is prevented by its trapping with TFAA to produce CF3CO2CH3. DFT calculations show that Sc(OTf)2+ and CF3CO2H combine with MnO4 to produce an active intermediate that undergoes HAT with CH4 with a low barrier of 12.5 kcal mol−1.

Graphical abstract: Synergistic activating effects of a strong Lewis acid (metal ion) and a strong Brønsted acid enable KMnO4 to oxidize CH4 at room temperature

Supplementary files

Article information

Article type
Research Article
Submitted
11 May 2025
Accepted
28 Jun 2025
First published
02 Jul 2025

Inorg. Chem. Front., 2025, Advance Article

Synergistic activating effects of a strong Lewis acid (metal ion) and a strong Brønsted acid enable KMnO4 to oxidize CH4 at room temperature

H. Shi, M. Zhou, C. Mak, K. Lau and T. Lau, Inorg. Chem. Front., 2025, Advance Article , DOI: 10.1039/D5QI01117E

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