Issue 2, 2025

Controlled isolation of a novel polymorphic form of chlorothiazide by spray drying

Abstract

This study outlines a route to producing a novel polymorphic form of chlorothiazide (CTZ). CTZ was spray dried using three different atomising gas flowrate settings to determine whether it has any effect on the solid-state of CTZ. At a lower atomising gas flowrate, a new form of CTZ, CTZ form IV, was obtained in pure form, whereas at the highest atomising gas flowrate, a mixture of CTZ form I and CTZ form IV was obtained. The morphology of CTZ form I was prism-shaped, and the new form, CTZ form IV, consisted of spherical clusters, some of which were porous and some non-porous. As a result of the rapid drying process, acetone was trapped within the porous clusters and could be released by milling. CTZ form IV has been shown to be stable at room temperature and below 40% relative humidity (RH); however, after 1 week of stability under accelerated conditions of 40 °C/75% RH, CTZ form IV converted to CTZ form I. Also, at high temperatures between 150 °C and 175 °C, CTZ form IV converted to form I, with the simultaneous release of acetone upon its morphology change. This study demonstrates how spray drying can be useful to discover new forms of APIs by a controlled drying process.

Graphical abstract: Controlled isolation of a novel polymorphic form of chlorothiazide by spray drying

Supplementary files

Article information

Article type
Paper
Submitted
03 Oct 2024
Accepted
08 Jan 2025
First published
16 Jan 2025
This article is Open Access
Creative Commons BY license

RSC Pharm., 2025,2, 398-412

Controlled isolation of a novel polymorphic form of chlorothiazide by spray drying

A. Parkes, E. Spoletti, J. O'Reilly, M. Lusi, A. Ziaee and E. O'Reilly, RSC Pharm., 2025, 2, 398 DOI: 10.1039/D4PM00286E

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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