Tailoring Defect Generation in SnO2 Nanostructure for Increased Selectivity in Electrochemical CO2 Reduction

Abstract

In order to achieve carbon neutrality, the CO2 reduction catalyst synthesized via a facile process with high selectivity and an industrial benchmark current density is of great interest. Herein, we propose the mesoporous SnO2 nanostructure synthesized using soft-templating assistance and alter the defects and active sites via defect engineering by annealing at a low optimal temperature of 300 °C. The electrochemical study shows highly improved CO2 reduction activity by SnO2-300V catalyst, achieving the faradic efficiency (F.E.) of 97.9 % for C1 products and selectivity of 94.1 % for formate (HCOOˉ) product at -1.1 V vs RHE in 0.1 M KHCO3. The sample also has a high partial current density of 12.6 mA cm-2 for HCOOˉ, high double-layer capacitance and low RCT value, compared to the other samples in this study. The low crystallite size, richness in grain boundaries and defect density were to be a combination of factors credited to increased selectivity in SnO2-300V. Density functional theory (DFT) calculation also revealed the moderate adsorption energy for *OCHO intermediate species and low adsorption energy for *HCOOH in defect-rich SnO2-300V sample, favouring the enhanced ECO2R activity. The best activity sample SnO2-300V tested in the flow-cell setup using a gas diffusion electrode exhibits a high current density of up to ~266 mA cm-2 in 1 M KOH, considerable stability and F.E.(HCOOˉ) ≥ 90.0 %, as per the industrial requirement. The work provides insight into the soft templating coupled with the defect engineering method of catalyst design for achieving scalable CO2R activity.

Supplementary files

Article information

Article type
Paper
Submitted
14 Jul 2025
Accepted
27 Aug 2025
First published
28 Aug 2025

Nanoscale, 2025, Accepted Manuscript

Tailoring Defect Generation in SnO2 Nanostructure for Increased Selectivity in Electrochemical CO2 Reduction

A. Jaiswal, S. S. V. P. R. karri, S. G. Kang, R. Kumar and S. H. Hur, Nanoscale, 2025, Accepted Manuscript , DOI: 10.1039/D5NR02968F

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