Engineering Pb-free relaxor ferroelectric thin films for low voltage energy storage applications

Abstract

Pulsed power technologies demand for dielectric capacitors that possess a high energy storage density and efficiency at low applied electric fields/voltages. In this work, we engineered the morphology of lead-free 0.85[0.6Ba(Zr0.2Ti0.8)O3-0.4(Ba0.7Ca0.3)TiO3]-0.15SrTiO3 (BZCT-STO) epitaxial thin films, fabricated by the pulsed laser deposition technique. Through the control of the annealing time, we observed both grain shape and size changes, which induced a change in the relaxor behaviour of the BZCT-STO films. The enhanced relaxor behaviour, assigned to the formation of polar nanoregions, was achieved in the film with uniform smaller spherical grains, which is relevant for improved energy storage performance at low electric fields. The electric field dependence on the ferroelectric and energy storage properties of the BZCT-STO thin films is investigated. It is found that the LSMO/BZCT-STO/Au capacitor with the enhanced relaxor behaviour shows the optimum energy storage performance, attributable to a moderate maximum polarization and remnant polarization difference, and the highest electric breakdown field. An energy storage density of 9.24 J/cm3, with an efficiency of 86.4%, at an applied electric field of 1500 kV/cm, was obtained. The elevated energy storage density and efficiency in these BZCT-STO thin film capacitors, at low electric field, make them one of the most promising systems reported in the literature for energy storage applications. The results here reported clearly evidence the significant impact of the film morphology on the dielectric, ferroelectric and energy storage properties.

Supplementary files

Article information

Article type
Paper
Submitted
13 Jun 2025
Accepted
27 Jul 2025
First published
28 Jul 2025
This article is Open Access
Creative Commons BY license

Nanoscale, 2025, Accepted Manuscript

Engineering Pb-free relaxor ferroelectric thin films for low voltage energy storage applications

D. Ribeiro, S. Nair, A. R. Jayakrishnan, J. Oliveira, G. Magagnin, D. Albertini, Y. Walter, K. C. Sekhar, J. A. Moreira, B. Almeida, B. Gautier, B. Vilquin, L. Marques, M. Pereira and J. Silva, Nanoscale, 2025, Accepted Manuscript , DOI: 10.1039/D5NR02537K

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