A close atomic surface of stainless steel produced by novel green chemical mechanical polishing using silica and lanthana mixed abrasives

Abstract

Stainless steel poses machining challenges due to its corrosion and wear resistance. Traditional chemical mechanical polishing (CMP) often involves using noxious slurries, resulting in environmental risks. Moreover, surface roughness Sa is normally higher than 0.5 nm on stainless steel using conventional CMP, and the material removal rate (MRR) is extremely low. To address these challenges, a novel green CMP method was developed, which uses silica, lanthana, malic acid, γ-aminobutyric acid and hydrogen peroxide. Following this environmentally friendly CMP process, the surface roughness Sa of stainless steel was reduced to 0.286 nm, with an MRR of 82.14 nm min−1. These results represent significant advancements compared to existing studies. X-ray photoelectron spectroscopy analysis demonstrates that hydrogen peroxide oxidized the surface of stainless steel, forming oxides. Malic acid then dissolved these oxides by releasing hydrogen ions. Meanwhile, γ-aminobutyric acid through its –COOH functional groups chelated Fe2+, Fe3+, and Cr3+ ions. This innovatively green CMP process suggests a fresh perspective on achieving fine surface roughness on stainless steel, simultaneously enhancing its wear and corrosion assistance. Its potential application in high-performance stainless steel devices is promising.

Graphical abstract: A close atomic surface of stainless steel produced by novel green chemical mechanical polishing using silica and lanthana mixed abrasives

Article information

Article type
Paper
Submitted
27 Apr 2025
Accepted
07 Jun 2025
First published
14 Jul 2025

Nanoscale, 2025, Advance Article

A close atomic surface of stainless steel produced by novel green chemical mechanical polishing using silica and lanthana mixed abrasives

Y. Wu, D. Wang, Z. Zhang, F. Zhao, H. Zhou, X. Liu and X. Yang, Nanoscale, 2025, Advance Article , DOI: 10.1039/D5NR01716E

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