Atomic force microscope-guided nanoscale 3D patterning for carbon nanofibers with in situ Raman spectroscopy

Abstract

Carbon nanotubes (CNTs) have attracted significant attention across various fields due to their exceptional electrical, thermal, and mechanical properties. Integrating CNTs with 3D patterning technology, particularly in the manufacturing of vertically stacked CNT fibers, is becoming increasingly important. The objective of this study is to utilize 3D patterning techniques to fabricate CNT nanofibers and to conduct in situ Raman spectroscopy analysis. Precise control of the water meniscus by a quartz tuning fork (QTF)-based atomic force microscopy (AFM) allows the simultaneous execution of nanoscale 3D patterning and in situ Raman analysis. The QTF-AFM technology offers high accuracy and precision without the need for high voltage or high-pressure conditions of conventional lithography techniques, which is a significant advantage in the fabrication of CNT nanofibers. The fabricated CNT nanofibers were then subsequently analyzed using in situ Raman spectroscopy, allowing for real-time monitoring of their structural properties. The results of this research provide a valuable methodology for advancing various fields, including electronic devices and catalysis, through an integrated platform. This study highlights the potential of merging nanoscale 3D patterning technology with real-time analytical techniques. The innovative approach demonstrated here is expected to contribute to the advancement of nanomaterial applications and pave the way for future innovations in the field.

Graphical abstract: Atomic force microscope-guided nanoscale 3D patterning for carbon nanofibers with in situ Raman spectroscopy

Supplementary files

Article information

Article type
Paper
Submitted
09 Mar 2025
Accepted
07 May 2025
First published
14 May 2025

Nanoscale, 2025, Advance Article

Atomic force microscope-guided nanoscale 3D patterning for carbon nanofibers with in situ Raman spectroscopy

Y. Bae, H. Jang, T. Yun, C. Yang, J. Hwang, M. Park, S. Lee, J. Son, K. Park, J. Kim, W. Jhe and S. An, Nanoscale, 2025, Advance Article , DOI: 10.1039/D5NR01018G

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