Issue 28, 2025

Conformality limits of 2D WS2 on 3D nanostructures

Abstract

3D nanostructures are a vital part of various applications envisaged for two-dimensional transition metal dichalcogenides (2D TMDs), such as nanoelectronics and catalysis. However, achieving conformal deposition of 2D TMD films on 3D nanostructures is challenging due to the requirement for bending the basal planes of the 2D TMDs. Here, the limits of conformality of 2D WS2 deposited by atomic layer deposition on SiO2 3D nanostructures are investigated through cross-sectional transmission electron microscopy imaging. A minimum radius of curvature of 4 nm is identified above which basal plane conformality is almost always observed, while for smaller radii conformality is only observed in approximately half of the cases. We show that the observed tipping point agrees with the balance between the adhesion and stiffness forces, which allows for the estimation of the critical radius of curvature for other 2D TMDs and substrates. These results provide guidelines for the design of 3D nanostructured devices and substrates on which conformality of 2D materials is desired.

Graphical abstract: Conformality limits of 2D WS2 on 3D nanostructures

Supplementary files

Article information

Article type
Paper
Submitted
08 Mar 2025
Accepted
30 Jun 2025
First published
01 Jul 2025
This article is Open Access
Creative Commons BY license

Nanoscale, 2025,17, 16922-16927

Conformality limits of 2D WS2 on 3D nanostructures

J. J. P. M. Schulpen, S. B. Basuvalingam, M. A. Verheijen and A. A. Bol, Nanoscale, 2025, 17, 16922 DOI: 10.1039/D5NR01013F

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