Robust Dehydrofluorination of HFC-245fa to HFO-1234ze via In-Situ VOFx Formation over Non-Oxalic acid assisted V2O5 /γ-Al2O3 Catalyst

Abstract

The demand for trans-1,3,3,3-tetrafluoropropene [HFO-1234ze(E)] as a next-generation, low-global-warming-potential (GWP) refrigerant is rising due to international restrictions on high-GWP refrigerants like chlorofluorocarbons (CFCs), hydrochlorofluorocarbons (HCFCs) and hydrofluorocarbons (HFCs). Catalytic dehydrofluorination of HFC-245fa offers a viable synthesis route for the production of HFO-1234ze(E), but the catalyst degradation under harsh acidic conditions remains a major challenge. In this study, a highly stable γ-Al2O3 supported catalyst was developed for efficient dehydrofluorination with vanadium species exhibited the highest activity among the screened metal ions Ni2+, V5+, Zn2+, La3+, Fe3+, Mn2+ and Cu2+.The optimized 15wt% V2O5/γ-Al2O3 catalyst, prepared without oxalic acid assistance, exhibited strong metal-support interactions and demonstrated superior catalytic performance achieving ~95% HFC-245fa conversion. The catalyst activity increased from 1.3 to 2.1 μmols-1 gcat-1 due to the formation of in-situ VOFx species generated through the interaction between V2O5 and HF, as confirmed by NH3-TPD and XPS analysis. The catalyst also ~81% selectivity towards HFO-1234ze(E) at 350 °C. Noteworthy, the catalyst maintained a stable performance up to 74 h, without significant deactivation. Overall, these results highlight the importance of rational metal selection, loading optimization, and interface engineering in developing robust catalysts for industrial hydrofluoroolefin production.

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Article information

Article type
Communication
Submitted
23 May 2025
Accepted
20 Aug 2025
First published
21 Aug 2025

Nanoscale Horiz., 2025, Accepted Manuscript

Robust Dehydrofluorination of HFC-245fa to HFO-1234ze via In-Situ VOFx Formation over Non-Oxalic acid assisted V2O5 /γ-Al2O3 Catalyst

F. Fatima, M. U. Rao, G. Chang-Chien, S. Masimukku, G. Madras, G. Satyanarayana and S. Challapalli, Nanoscale Horiz., 2025, Accepted Manuscript , DOI: 10.1039/D5NH00366K

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