hBN/TiO2 water-based nanolubricants: a solution for stick–slip mitigation in tribological applications

Abstract

In this study, the stick–slip behaviour of synthesised water-based nanolubricants was investigated via an Rtec ball-on-disk tribometer. By varying the lubricating conditions, including the concentration of hBN/TiO2 as nanoadditives, the tribological properties and lubrication mechanisms were analysed, especially the stick–slip phenomenon. Compared with dry and wet conditions, the hBN/TiO2 nanolubricant presented better efficiency in mitigating stick–slip and achieving friction stability. The relationship between anti-stick–slip properties and lubrication assisted in the selection of high-performance water-based nanoadditives. At a concentration of 0.5 wt% hBN/TiO2, the nanolubricant achieved the lowest average coefficient of friction (COF) of up to 78% compared to that under dry conditions. Additionally, the 0.5 wt% hBN/TiO2 nanolubricant showed an excellent anti-stick–slip effect, with the overall stick–slip phenomenon and threshold speed reduced by 77% and 72%, respectively, compared with those under dry conditions. Moreover, the findings indicate that the anti-stick–slip effect under wet conditions is superior to that under dry conditions. The mechanism of hBN/TiO2 nanoadditives in inhibiting stick–slip behaviour involves trapping wear debris and forming uniform tribofilms. It can be predicted that an optimal concentration of hBN/TiO2 (0.5 wt%) can eliminate the stick–slip phenomenon and effectively improve the friction state of the sliding interface.

Graphical abstract: hBN/TiO2 water-based nanolubricants: a solution for stick–slip mitigation in tribological applications

Supplementary files

Article information

Article type
Paper
Submitted
19 Dec 2024
Accepted
30 Jan 2025
First published
06 Feb 2025
This article is Open Access
Creative Commons BY license

Nanoscale Adv., 2025, Advance Article

hBN/TiO2 water-based nanolubricants: a solution for stick–slip mitigation in tribological applications

A. Morshed, F. Lin, H. Wu, Z. Xing, S. Jiao, M. M. Hasan and Z. Jiang, Nanoscale Adv., 2025, Advance Article , DOI: 10.1039/D4NA01049C

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