Correction: Boric acid-mediated sol–gel construction of transparent, photoactive TiO2 films

Su Yeon Rhee; Duc Tai Nguyen; Sang Yeong Han; Konstantin Klementiev; Wongu Youn; Gyeongwon Yun; Yongmin Kwon; Sang Woo Han; Ji Hun Kim; Taek-Soo Kim; Hojae Lee; Gulaim A. Seisenbaeva; Vadim G. Kessler; Insung S. Choi

doi:10.1039/D5CC90373D

Correction: Boric acid-mediated sol–gel construction of transparent, photoactive TiO₂ films

Su Yeon Rhee,^a Duc Tai Nguyen,^a Sang Yeong Han,^a Konstantin Klementiev,^c Wongu Youn,^a Gyeongwon Yun,^a Yongmin Kwon,^a Sang Woo Han,^a Ji Hun Kim,^d Taek-Soo Kim,^d Hojae Lee,^e Gulaim A. Seisenbaeva,*^b Vadim G. Kessler*^b and Insung S. Choi*^a

Author affiliations

* Corresponding authors

^a Department of Chemistry, KAIST, Daejeon 34141, South Korea
E-mail: ischoi@kaist.ac.kr

^b Department of Molecular Sciences, SLU, Uppsala, Sweden
E-mail: vadim.kessler@slu.se, gulaim.seisenbaeva@slu.se

^c MAX IV Laboratory, Lund University, Lund 22100, Sweden

^d Department of Mechanical Engineering, KAIST, Daejeon 34141, South Korea

^e Department of Chemistry, Hallym University, Chuncheon 24252, South Korea

Abstract

Correction for ‘Boric acid-mediated sol–gel construction of transparent, photoactive TiO₂ films’ by Su Yeon Rhee et al., Chem. Commun., 2025, https://doi.org/10.1039/d5cc05088j.

Chemical Communications

Correction: Boric acid-mediated sol–gel construction of transparent, photoactive TiO₂ films

Abstract

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Correction: Boric acid-mediated sol–gel construction of transparent, photoactive TiO₂ films

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