Gradient aerosol chemical vapor deposition (GA-CVD) for vertically graded thin films of MoxW1−xS2 and WxMo1−xS2

Abraham Barde; Huda Salam Al-Jurani; Brendan Ward-O’Brien; Mark A. Buckingham; Robert Cernik; David J. Lewis

doi:10.1039/D5CC00237K

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Gradient aerosol chemical vapor deposition (GA-CVD) for vertically graded thin films of Mo_xW_1−xS₂ and W_xMo_1−xS₂†

Abraham Barde,^a Huda Salam Al-Jurani,^a Brendan Ward-O’Brien,

^a Mark A. Buckingham,

^a Robert Cernik^a and David J. Lewis

*^a

Author affiliations

* Corresponding authors

^a Department of Materials, The University of Manchester, Oxford Road, UK
E-mail: david.lewis-4@manchester.ac.uk

Abstract

We report the first gradient aerosol chemical vapor deposition approach to fabricate vertically graded Mo_xW_1−xS₂ and W_xMo_1−xS₂ thin films.

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Article information

DOI: https://doi.org/10.1039/D5CC00237K
Article type: Communication
Submitted: 14 Jan 2025
Accepted: 07 Feb 2025
First published: 17 Feb 2025
This article is Open Access

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Chem. Commun., 2025,61, 4407-4410

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Gradient aerosol chemical vapor deposition (GA-CVD) for vertically graded thin films of Mo_xW_1−xS₂ and W_xMo_1−xS₂

A. Barde, H. S. Al-Jurani, B. Ward-O’Brien, M. A. Buckingham, R. Cernik and D. J. Lewis, Chem. Commun., 2025, 61, 4407 DOI: 10.1039/D5CC00237K

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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Chemical Communications