Issue 22, 2025

Gradient aerosol chemical vapor deposition (GA-CVD) for vertically graded thin films of MoxW1−xS2 and WxMo1−xS2

Abstract

We report the first gradient aerosol chemical vapor deposition approach to fabricate vertically graded MoxW1−xS2 and WxMo1−xS2 thin films.

Graphical abstract: Gradient aerosol chemical vapor deposition (GA-CVD) for vertically graded thin films of MoxW1−xS2 and WxMo1−xS2

Supplementary files

Article information

Article type
Communication
Submitted
14 Jan 2025
Accepted
07 Feb 2025
First published
17 Feb 2025
This article is Open Access
Creative Commons BY license

Chem. Commun., 2025,61, 4407-4410

Gradient aerosol chemical vapor deposition (GA-CVD) for vertically graded thin films of MoxW1−xS2 and WxMo1−xS2

A. Barde, H. S. Al-Jurani, B. Ward-O’Brien, M. A. Buckingham, R. Cernik and D. J. Lewis, Chem. Commun., 2025, 61, 4407 DOI: 10.1039/D5CC00237K

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