Issue 29, 2024

Anomalous thermal transport of vertically stacked PtSe2 thin films with interface formation

Abstract

Two-dimensional (2D) transition metal dichalcogenide (TMDC) materials are indispensable candidates for thermoelectric (TE) device applications. However, thermal transport at low temperatures, as an important TE device application, has not been fully realized, especially in large-area 2D TMDC films. Here, we report temperature-dependent in-plane Seebeck coefficients, along with electrical and thermal conductivities, of both 3 nm-thick PtSe2 films and stacked 2D/2D semiconducting PtSe2/PtSe2 (3 nm/3 nm) homostructures at temperatures ranging from 40 to 300 K using a homemade Seebeck coefficient measurement module and a heat diffusion imaging method, respectively. In the single 2D PtSe2 (3 nm) film, simultaneous decreases in the in-plane Seebeck coefficient and electrical conductivity were observed with decreasing temperature, indicating the presence of both semiconductor and metallic properties. At 300 K, the in-plane Seebeck coefficient of the single 2D PtSe2 film is ∼65.1 μV K−1, whereas those of the 2-, 3-, and 4-stacked PtSe2/PtSe2 homostructures are ∼69.1, ∼79.0 and ∼72.0 μV K−1, respectively due to interface formation between the PtSe2 layer. The in-plane thermal conductivity of the single PtSe2 film is ∼28.3 W m−1 K at 300 K and reaches maximum values of ∼98.5 and ∼12.1 W m−1 K at 97 and 42 K, respectively. Our findings demonstrate the feasibility of utilizing 2D semiconducting PtSe2 layers with interface formation between the 2D layers as TE energy-saving and energy-generating devices, as they exhibit the TE properties required by an ideal TE material.

Graphical abstract: Anomalous thermal transport of vertically stacked PtSe2 thin films with interface formation

Article information

Article type
Paper
Submitted
27 Apr 2024
Accepted
06 Jun 2024
First published
06 Jun 2024

J. Mater. Chem. A, 2024,12, 18348-18357

Anomalous thermal transport of vertically stacked PtSe2 thin films with interface formation

J. Cho, W. Lee, F. F. Tonni, M. Kim, Y. Kim, H. J. Kwon, J. Choi, M. Zebarjadi, N. Park, S. S. Das, G. Kim and S. Lee, J. Mater. Chem. A, 2024, 12, 18348 DOI: 10.1039/D4TA02911A

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