Issue 44, 2024

Tunable electronic and optical properties of Janus Al2M2ClBr (M = O, S) monolayers for UV photodetector applications

Abstract

Wide-bandgap 2D materials for UV photodetectors have many advantages, such as flexibility and efficiency. For this reason, the quest for novel 2D semiconductor materials is the primary focus of ongoing research endeavors. In this study, the electronic and optical characteristics of Janus Al2M2ClBr (M = O, S) monolayers have been meticulously examined by density functional theory (DFT). It was confirmed that these monolayers exhibit structural robustness for indirect bandgap Al2O2ClBr or direct bandgap Al2S2ClBr. Moreover, they demonstrate a low effective mass for the photogenerated electrons and holes. The bandgap is notably modulated by strain engineering, whereas the impact of the electric field is minimal. Notably, strong light absorption within the 8 to 12 eV range has been confirmed, with absorption coefficients surpassing 105 cm−1 for Janus Al2M2ClBr (M = O, S) monolayers. The optical properties can be finely tuned by strain engineering, although the influence of an electric field on these properties is insignificant. Considering the combination of optical and electrical characteristics, Janus Al2M2ClBr (M = O, S) monolayers are promising for UV photodetector applications. As a result, this study provides invaluable theoretical insights into the development of UV photodetectors utilizing Janus monolayers and is poised to significantly enrich the expansion of Janus monolayer materials in the foreseeable future.

Graphical abstract: Tunable electronic and optical properties of Janus Al2M2ClBr (M = O, S) monolayers for UV photodetector applications

Supplementary files

Article information

Article type
Paper
Submitted
30 May 2024
Accepted
11 Sep 2024
First published
30 Oct 2024

New J. Chem., 2024,48, 18826-18835

Tunable electronic and optical properties of Janus Al2M2ClBr (M = O, S) monolayers for UV photodetector applications

Y. Liu, X. Ma, T. Xie, Y. Ren, J. Zhu, N. Ma, J. Lu and J. Hong, New J. Chem., 2024, 48, 18826 DOI: 10.1039/D4NJ02491E

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