High resistance of superconducting TiN thin films against environmental attacks

Abstract

Superconductors, an essential class of functional materials, hold a vital position in both fundamental science and practical applications. However, most superconductors, including MgB2, Bi2Sr2CaCu2O8+δ, and FeSe, are highly sensitive to environmental attacks (such as from water and moist air), hindering their wide applications. More importantly, the surface physical and chemical processes of most superconductors in various environments remain poorly understood. Here, we comprehensively investigate the high resistance of superconducting titanium nitride (TiN) epitaxial films against acid and alkali attacks. Unexpectedly, despite immersion in acid and alkaline solutions for over 7 days, the crystal structure and superconducting properties of TiN films remain stable, as demonstrated by high-resolution X-ray diffraction, electrical transport, atomic force microscopy, and scanning electron microscopy. Furthermore, combining scanning transmission electron microscopy analysis with density functional theory calculations revealed the corrosion mechanisms: acid corrosions lead to the creation of numerous defects due to the substitution of Cl ions for N anions, whereas alkaline environments significantly reduce the film thickness through the stabilization of OH* adsorbates. Our results uncover the unexpected stability and durability of superconducting materials against environmental attacks, highlighting their potential for enhanced reliability and longevity in diverse applications.

Graphical abstract: High resistance of superconducting TiN thin films against environmental attacks

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Article information

Article type
Communication
Submitted
24 Jul 2024
Accepted
01 Oct 2024
First published
03 Oct 2024

Mater. Horiz., 2024, Advance Article

High resistance of superconducting TiN thin films against environmental attacks

Z. Guo, M. Ge, Y. Zhou, J. Bi, Q. Zhang, J. Zhang, J. Ye, R. Zhai, F. Ge, Y. Huang, R. Zhang, X. Yao, L. Huang and Y. Cao, Mater. Horiz., 2024, Advance Article , DOI: 10.1039/D4MH00959B

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