Issue 11, 2023

Electrospun single-phase spinel magnetic high entropy oxide nanoparticles via low-temperature ambient annealing

Abstract

High entropy oxide nanoparticles (HEO NPs) with multiple component elements possess improved stability and multiple uses for functional applications, including catalysis, data memory, and energy storage. However, the synthesis of homogenous HEO NPs containing five or more immiscible elements with a single-phase structure is still a great challenge due to the strict synthetic conditions. In particular, several synthesis methods of HEO NPs require extremely high temperatures. In this study, we demonstrate a low cost, facile, and effective method to synthesize three- to eight-element HEO nanoparticles by a combination of electrospinning and low-temperature ambient annealing. HEO NPs were generated by annealing nanofibers at 330 °C for 30 minutes under air conditions. The average size of the HEO nanoparticles was ∼30 nm and homogenous element distribution was obtained from post-electrospinning thermal decomposition. The synthesized HEO NPs exhibited magnetic properties with the highest saturation magnetization at 9.588 emu g−1 and the highest coercivity at 147.175 Oe for HEO NPs with four magnetic elements while integrating more nonmagnetic elements will suppress the magnetic response. This electrospun and low-temperature annealing method provides an easy and flexible design for nanoparticle composition and economic processing pathway, which offers a cost- and energy-effective, and high throughput entropy nanoparticle synthesis on a large scale.

Graphical abstract: Electrospun single-phase spinel magnetic high entropy oxide nanoparticles via low-temperature ambient annealing

Supplementary files

Article information

Article type
Paper
Submitted
10 Feb 2023
Accepted
02 May 2023
First published
19 May 2023
This article is Open Access
Creative Commons BY-NC license

Nanoscale Adv., 2023,5, 3075-3083

Electrospun single-phase spinel magnetic high entropy oxide nanoparticles via low-temperature ambient annealing

X. Han, D. Li, J. Zhou, Y. Zheng, L. Kong, L. Li and F. Yan, Nanoscale Adv., 2023, 5, 3075 DOI: 10.1039/D3NA00090G

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