Issue 12, 2022

Large in-plane piezo-strain enhanced voltage control of magnetic anisotropy in Si-compatible multiferroic thin films

Abstract

Voltage control of magnetic anisotropy (VCMA) in Si-compatible ferroelectric/ferromagnetic multiferroic thin films is promising to enable power-efficient and integrated magnetic memories. However, their VCMA effect is weak and is always smaller than that of the bulk counterparts. Here, we achieve a more substantial VCMA effect in thin films than in the bulk, benefiting from the large in-plane piezo-strain mediated magnetoelectric coupling under strong fields. Si-compatible ferroelectric Pb(Zr,Ti)O3 (PZT) thin films with large breakdown strength of up to 3.2 MV cm−1 are fabricated to further construct multiferroic thin films. Since conventional methods fail to measure the VCMA effect under strong fields, we establish a micro-ferromagnetic resonance method based on micro-fabrication. An enhanced VCMA effect is demonstrated in PZT/CoFeB thin films, whose voltage-induced effective magnetic field (Heff) could experimentally reach 26.1 Oe, which is much stronger than that in bulk control samples “PZT ceramic/CoFeB” (2.6 Oe) and “PMN-PT single crystal/CoFeB” (18.5 Oe) as well as previous reports. Theoretically, the Heff in thin films could be > 60 Oe near the breakdown strength, resulting from a giant in-plane piezo-strain S31 < −0.3%, which is comparable to that of the best ferroelectric single crystals. Si-compatible multiferroic thin films with enhanced VCMA will be a useful platform for developing integrated magnetic and spintronic devices.

Graphical abstract: Large in-plane piezo-strain enhanced voltage control of magnetic anisotropy in Si-compatible multiferroic thin films

Supplementary files

Article information

Article type
Communication
Submitted
17 Aug 2022
Accepted
21 Sep 2022
First published
26 Sep 2022

Mater. Horiz., 2022,9, 3013-3021

Large in-plane piezo-strain enhanced voltage control of magnetic anisotropy in Si-compatible multiferroic thin films

B. Peng, Q. Lu, H. Tang, Y. Zhang, Y. Cheng, R. Qiu, Y. Guo, Z. Zhou and M. Liu, Mater. Horiz., 2022, 9, 3013 DOI: 10.1039/D2MH01020H

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