Interface engineering in low-dimensional bismuth-based materials for photoreduction reactions

Abstract

Due to their fascinating strengths in boosting light-absorption, charge transfer dynamics, and interface catalysis reactions, low-dimensional materials have been regarded as effective configurations for achieving excellent photocatalytic performance. Owing to these features, low-dimensional bismuth-based materials have acquired great progress in recent years for photoreduction reactions. In this review, we begin by describing the controlled synthesis of various low-dimensional bismuth-based materials, which can be classified as liquid exfoliation, direct precipitation, hydrothermal/solvothermal, surfactant self-assembly method, template-directed strategy and lamellar hybrid intermediate strategy. We summarize the recent advances of diverse interface engineering approaches for photoreduction activity optimization via tuning fine geometric and electronic structures, such as bismuth-rich strategy, crystal facet control, facet junction, surface defect engineering, strain engineering, co-catalysts, single atoms modification and heterojunction. Finally, we end this review with an outlook on the future opportunities and challenges of low-dimensional bismuth-based materials for photoreduction reactions.