Issue 20, 2021

High shear in situ exfoliation of 2D gallium oxide sheets from centrifugally derived thin films of liquid gallium

Abstract

A diversity of two-dimensional nanomaterials has recently emerged with recent attention turning to the post-transition metal elements, in particular material derived from liquid metals and eutectic melts below 330 °C where processing is more flexible and in the temperature regime suitable for industry. This has been explored for liquid gallium using an angled vortex fluidic device (VFD) to fabricate ultrathin gallium oxide (Ga2O3) sheets under continuous flow conditions. We have established the nanosheets to form highly insulating material and have electrocatalytic activity for hydrogen evolution, with a Tafel slope of 39 mV dec−1 revealing promoting effects of the surface oxidation (passivation layer).

Graphical abstract: High shear in situ exfoliation of 2D gallium oxide sheets from centrifugally derived thin films of liquid gallium

Supplementary files

Article information

Article type
Communication
Submitted
02 Aug 2021
Accepted
31 Aug 2021
First published
01 Sep 2021
This article is Open Access
Creative Commons BY license

Nanoscale Adv., 2021,3, 5785-5792

High shear in situ exfoliation of 2D gallium oxide sheets from centrifugally derived thin films of liquid gallium

K. Vimalanathan, T. Palmer, Z. Gardner, I. Ling, S. Rahpeima, S. Elmas, J. R. Gascooke, C. T. Gibson, Q. Sun, J. Zou, M. R. Andersson, N. Darwish and C. L. Raston, Nanoscale Adv., 2021, 3, 5785 DOI: 10.1039/D1NA00598G

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