Issue 2, 2021

Breaking the symmetry of nanosphere lithography with anisotropic plasma etching induced by temperature gradients

Abstract

We report a novel anisotropic process, termed plasma etching induced by temperature gradients (PE-TG), which we use to modify the 3D morphology of a hexagonally close-packed polystyrene sphere array. Specifically, we combined an isotropic oxygen plasma (generated by a plasma cleaner) and a vertical temperature gradient applied from the bottom to the top of a colloidal mask to create an anisotropic etching process. As a result, an ordered array of well-defined and separated nano mushrooms is obtained. We demonstrate that the features of the mushrooms, namely the hat size and their intrinsic undercut, as well as the pillar diameter and height, can be easily tuned by adjusting the main parameters of the process i.e. the temperature gradient and etching time, or the spheres' size. We show that PS mushroom arrays can be used as nanostructured templates to fabricate plasmonic arrays, such as gold-capped nano mushrooms and ultra-small nanoapertures, by using vertical and oblique gold sputtering deposition respectively. PE-TG reveals a new, cheap and facile approach to produce plasmonic nanostructures of great interest in the fields of molecular sensing, surface-enhanced Raman scattering (SERS), energy harvesting and optoelectronics. We study the optical properties of the Au-capped nano mushroom arrays and their performance as biosensing platforms by performing SERS measurements.

Graphical abstract: Breaking the symmetry of nanosphere lithography with anisotropic plasma etching induced by temperature gradients

Supplementary files

Article information

Article type
Communication
Submitted
27 Aug 2020
Accepted
10 Dec 2020
First published
11 Dec 2020
This article is Open Access
Creative Commons BY license

Nanoscale Adv., 2021,3, 359-369

Breaking the symmetry of nanosphere lithography with anisotropic plasma etching induced by temperature gradients

D. Darvill, M. Iarossi, R. M. Abraham Ekeroth, A. Hubarevich, J. Huang and F. De Angelis, Nanoscale Adv., 2021, 3, 359 DOI: 10.1039/D0NA00718H

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

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