Issue 11, 2021

High length-to-width aspect ratio lead bromide microwires via perovskite-induced local concentration gradient for X-ray detection

Abstract

Semiconducting microwires with high length-to-width (L : W) aspect ratio are well suited for electronic and optoelectronic applications. Conventional approaches that first crystallize wires in a solution then mechanically transfer to device-integrable substrates are vulnerable to wire breakage and contamination, resulting in poor reproducibility. Here we introduce a strategy to grow long, thin lead bromide (PbBr2) microwires with the aid of a gradient. We take advantage of PbBr2 and methylammonium lead bromide (MAPbBr3) perovskite co-crystallization to create a local increase in the PbBr2 to methylammonium bromide (MABr) concentration ratio. We then present the successful growth of well-oriented PbBr2 microwires over 1 cm in length and as thin as 1.6 μm in diameter, reaching a maximum 5000 L : W ratio under optimized conditions; this value is almost 200 times larger than we found in pure PbBr2 solution. Structural characterization and elemental composition mapping show no additional phases or impurities present in the dried crystals, and planar-integrated microwires on conductive substrates show an ON/OFF ratio of 10 when exposed to X-ray photons.

Graphical abstract: High length-to-width aspect ratio lead bromide microwires via perovskite-induced local concentration gradient for X-ray detection

Supplementary files

Article information

Article type
Paper
Submitted
04 Jan 2021
Accepted
25 Feb 2021
First published
01 Mar 2021

CrystEngComm, 2021,23, 2215-2221

High length-to-width aspect ratio lead bromide microwires via perovskite-induced local concentration gradient for X-ray detection

E. Dennis, S. Kundu, D. Thrithamarassery Gangadharan, J. Huang, V. M. Burlakov, D. Richtsmeier, M. Bazalova-Carter, D. C. Leitch and M. I. Saidaminov, CrystEngComm, 2021, 23, 2215 DOI: 10.1039/D1CE00015B

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements