Issue 17, 2021

Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films

Abstract

Here, we report on a simultaneous growth and radical-initiated cross-linking of a hybrid thin film in a layer-by-layer manner via molecular layer deposition (MLD). The cross-linked film exhibited a self-limiting MLD growth behavior and improved properties like 12% higher film density and enhanced stability compared to the non-cross-linked film.

Graphical abstract: Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films

Supplementary files

Article information

Article type
Communication
Submitted
02 Dec 2020
Accepted
21 Jan 2021
First published
21 Jan 2021

Chem. Commun., 2021,57, 2160-2163

Radical-triggered cross-linking for molecular layer deposition of SiAlCOH hybrid thin films

K. Ashurbekova, K. Ashurbekova, I. Saric, E. Modin, M. Petravic, I. Abdulagatov, A. Abdulagatov and M. Knez, Chem. Commun., 2021, 57, 2160 DOI: 10.1039/D0CC07858A

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