Issue 34, 2020

Self-assembly of noble metal-free graphene–copper plasmonic metasurfaces

Abstract

The strong light confinement and near field enhancement by metallic scatters enabled the development of a large family of plasmonic-based technologies, including broadly used gold metasurfaces. Despite progress, the engineering of non-precious metal plasmonic devices remains challenging, due to the limited chemical stability of most nanostructured metals. Here, we report the preparation of earth-abundant plasmonic metasurfaces by the engineering of copper-graphene nano-resonators, and their use as localized surface plasmon resonance (LSPR) sensors. We achieve the large-scale self-assembly of Cu nanocrystals, featuring a protective graphene film, by one-step reduction of CuO nanoparticle networks in a hydrocarbon-containing atmosphere. Microscopic and spectroscopic investigations reveal that coalescence and reduction of the CuO nanoparticles during graphene growth result in the formation of graphene-encapsulated metallic Cu nano-islands (NIs). These Cu–graphene metasurfaces can detect down to 1% concentrations of toluene gas at room temperature, displaying a reproducible and rapid LSPR shift of 0.2 nm. Finite-difference time-domain (FDTD) simulation and structural characterization reveal that the graphene layer significantly improves the Cu crystals’ long-term stability, leading to a prolonged LSPR performance over periods of three months. These insights provide promising directions for the development of earth-abundant plasmonic materials with applications ranging from biosensing to photo-catalysis and other optoelectronic devices.

Graphical abstract: Self-assembly of noble metal-free graphene–copper plasmonic metasurfaces

Supplementary files

Article information

Article type
Paper
Submitted
16 Jun 2020
Accepted
29 Jul 2020
First published
30 Jul 2020

J. Mater. Chem. C, 2020,8, 11896-11905

Self-assembly of noble metal-free graphene–copper plasmonic metasurfaces

I. Di Bernardo, J. Bradford, Z. Fusco, J. Mendoza, T. Tran-Phu, R. Bo, N. Motta and A. Tricoli, J. Mater. Chem. C, 2020, 8, 11896 DOI: 10.1039/D0TC02848G

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