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Mode cleaning in graphene oxide-doped polymeric whispering gallery mode microresonators

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Abstract

The strategy to incorporate graphene oxide (GO) in a composite material offers significant opportunities to realize compact photonic devices, such as saturable absorbers and polarization selective devices. However, the processing of GO-based composites by direct laser writing, which would afford vast patterning and material flexibility in a single step process, has been little addressed. In this work, we investigated the mechanisms underlying a mode cleaning effect in polymeric whispering gallery mode microresonators containing GO, aiming at the development of on-chip integrable photonic devices. We fabricated the microresonators (cavity loaded Q-factor of 20 000 at 1550 nm) in a single step of femtosecond laser writing via two-photon polymerization. By calculating the resonance response to damping mechanisms in the microresonators, we showed that additional losses introduced by GO play a major role in reducing the visibility of a number of resonances up to the point of effectively filtering a set of modes out. Interestingly, although the presence of GO leads to extra losses in the microresonator, it does not change the order of magnitude of the Q-factor of the highest extinction ratio resonances. Overall, this work offers interesting physical insights that can be useful for the design and fabrication of GO-based photonic micro/nanodevices.

Graphical abstract: Mode cleaning in graphene oxide-doped polymeric whispering gallery mode microresonators

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Article information


Submitted
19 May 2020
Accepted
21 Jun 2020
First published
22 Jun 2020

J. Mater. Chem. C, 2020, Advance Article
Article type
Paper

Mode cleaning in graphene oxide-doped polymeric whispering gallery mode microresonators

N. B. Tomazio, K. T. Paula, F. R. Henrique, M. B. Andrade, X. Roselló-Mechó, M. Delgado-Pinar, M. V. Andrés and C. R. Mendonca, J. Mater. Chem. C, 2020, Advance Article , DOI: 10.1039/D0TC02403A

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