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Recent progress in high performance Photo-detectors enabled by pulse laser deposition technology

Abstract

In recent decade, photo-detectors have very important applications in image sensing, optical communication, fire detection, environmental monitoring, space detection, safety detection, many other scientific research and industrial technology fields, which are regarded as key components of wearable devices. Compared to traditional fabrication approaches, pulsed-laser deposition (PLD) grown materials for photo-detector offer several merits. First of all, it is a clean physical vapor deposition approach. A stoichiometric amount of atoms can be transferred from the target to the substrate, avoiding complicated and potentially dangerous chemical reactions. Furthermore, PLD process was carried out in a high vacuum environment. Therefore, almost no contaminants, such as catalysts, precursors, surfactants and by-products, will be introduced. Also, the thickness of the films can be dominated by simply manipulating the energy and the pulse number of the pulsed laser. And then, fabrication temperature is relatively low, which is available to deposit materials on various substrate even flexible ones. Most importantly, PLD is a large area coverage deposition technology, which can produce centimeter-scale thin films, the planar geometry of which is of great significance potential for compact device-integration with modern semiconductor techniques. Consequently, this concept introduces recent advances on the materials, fabrication, and application of pulsed-laser deposition for a variety of high performance photo-detector from an overall perspective. Moreover, challenges and future development trends are also discussed.

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Article information


Submitted
30 Dec 2019
Accepted
27 Feb 2020
First published
13 Mar 2020

J. Mater. Chem. C, 2020, Accepted Manuscript
Article type
Review Article

Recent progress in high performance Photo-detectors enabled by pulse laser deposition technology

B. Wang, Z. zhang, S. zhong, Z.Q. Zheng, P. Xu and H. Zhang, J. Mater. Chem. C, 2020, Accepted Manuscript , DOI: 10.1039/C9TC07098B

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