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Photo-cleavable perfluoroalkylated copolymers for tailoring quantum dot thin films

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We report the synthesis, operating mechanism, and application of a copolymer that reveals increasing solubility in fluorous solvents by photolysis. The copolymer, PFBI, was prepared by polymerizing perfluorooctyl methacrylate (FOMA), benzilmonooxime methacrylate (BMOMA) and isobornyl methacrylate (IBMA). It showed a solubility of bigger than 20% (w/v) in a fluorous solvent, 1,1,1,2,3,3-hexafluoro-4-(1,1,2,3,3,3-hexafluoropropoxy)pentane (PF-7600), and the solution could be spin-cast to form 1.5 μm-thick films. When 365 nm UV light was irradiated onto it, 7 μm size stencil patterns could be formed after the UV-exposed regions were washed out with a fluorous solvent of a weaker dissolving power. To verify the responsible chemical mechanism for this increasing solubility, PFBI after UV irradiation was checked by size exclusion chromatography (SEC); no significant molecular weight decrease could be observed. This result suggested that UV exposure may cause the cleavage of the benzilmonooxime moieties, the side units, rather than significant polymer main-chain scission to increase the solubility. As an example of useful applications, PFBI was employed as a stencil material to produce micro-patterned quantum dot (QD) films. After casting a PFBI thin film on a Si substrate, wells for holding the QD ink were formed by UV exposure. After a red QD solution was deposited on the template by spin-coating, the stencil was removed by dissolution in a fluorous solvent, resulting in the 60 μm-sized red QD film arrays. The same steps were repeated with a green QD solution, and two colour QD film arrays could be built successfully. This result demonstrates that PFBI can be applied as a useful patterning material in the organic and printed electronics field.

Graphical abstract: Photo-cleavable perfluoroalkylated copolymers for tailoring quantum dot thin films

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Article information

16 Jul 2020
17 Sep 2020
First published
24 Sep 2020

Polym. Chem., 2020, Advance Article
Article type

Photo-cleavable perfluoroalkylated copolymers for tailoring quantum dot thin films

J. Son, H. Roh, H. Y. Shin, K. Park, C. Park, H. Park, C. Lee, J. Kwak, B. J. Jung and J. Lee, Polym. Chem., 2020, Advance Article , DOI: 10.1039/D0PY01017K

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