Issue 46, 2020

Stabilizing resistive random access memory by constructing an oxygen reservoir with analyzed state distribution

Abstract

In this paper, the instability mechanism of resistive random access memory (RRAM) was investigated, and a technique was developed to stabilize the distribution of high resistance states (HRS) and better concentrate the set voltage. Due to the accumulation of oxygen, an interface-type switching characteristic was observed on the IV curves beneath the filament-type switching behavior. In this work, the interface-type switching characteristic is used to fit the natural distribution of HRS as an analysis of the instability mechanism. According to the results, the HRS distribution is attributed to the accumulation of excess oxygen ions left from the lower oxygen content and oxygen vacancy recombination during the reset process. The proposed solution with simple plasma treatment, can create an excess oxygen reservoir by changing the surface topography of the electrode to store the surplus oxygen ions from the reset process, eliminating the oxygen accumulation effect and further improving the device stability.

Graphical abstract: Stabilizing resistive random access memory by constructing an oxygen reservoir with analyzed state distribution

Article information

Article type
Communication
Submitted
02 Jun 2020
Accepted
29 Oct 2020
First published
30 Oct 2020

Nanoscale, 2020,12, 23532-23536

Stabilizing resistive random access memory by constructing an oxygen reservoir with analyzed state distribution

C. Lin, K. Zhou, T. Chang, L. Sun, Y. Tan, C. Wu, Y. Yeh, W. Chen, C. Lin, W. Huang, C. Wu, S. Lin, T. Lin, J. Huang and S. M. Sze, Nanoscale, 2020, 12, 23532 DOI: 10.1039/D0NR04225K

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