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Issue 40, 2020
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Two ruthenium polypyridyl complexes functionalized with thiophen: synthesis and antibacterial activity against Staphylococcus aureus

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Abstract

Two ruthenium polypyridyl complexes: [Ru(dmb)2(ETPIP)](ClO4)2 (Ru(II)-1) and [Ru(phen)2(ETPIP)](ClO4)2 (Ru(II)-2) (dmb = 4,4′-dimethyl-2,2′-bipyridine, phen = 1,10-phenanthroline, ETPIP = 2-(4-(thiophen-2-ylethynyl)phenyl)-1H-imidazo[4,5-f][1,10]phenanthroline), have been synthesized and characterized. Their antimicrobial activities against S. aureus were assessed. Both the complexes Ru(II)-1, and Ru(II)-2 show meaningful activity against Staphylococcus aureus and the lead complex of this set, Ru(II)-2 (MIC = 0.025 mg mL−1), was further tested against biofilms. Given the fact that S. aureus could easily develop resistance to common antimicrobials, we also investigated whether bacteria can easily develop resistance to Ru(II)-2. The result demonstrated that S. aureus did not easily develop resistance to the ruthenium complexes. In addition, the synergism between Ru(II)-2 and common antibiotics against S. aureus was also investigated using the checkerboard method. Interestingly, Ru(II)-2 could increase the susceptibility of S. aureus to the aminoglycoside antibiotic (kanamycin). Finally, a possible mechanism of the observed synergetic effects was investigated by real-time PCR. All in all, these results confirmed that ruthenium complexes have good antimicrobial activity against Staphylococcus aureus.

Graphical abstract: Two ruthenium polypyridyl complexes functionalized with thiophen: synthesis and antibacterial activity against Staphylococcus aureus

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Supplementary files

Article information


Submitted
12 Jun 2020
Accepted
31 Jul 2020
First published
04 Sep 2020

New J. Chem., 2020,44, 17215-17221
Article type
Paper

Two ruthenium polypyridyl complexes functionalized with thiophen: synthesis and antibacterial activity against Staphylococcus aureus

X. Liao, G. Jiang, J. Wang, X. Duan, Z. Liao, X. Lin, J. Shen, Y. Xiong and G. Jiang, New J. Chem., 2020, 44, 17215
DOI: 10.1039/D0NJ02944K

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