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Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (V3D3) and azasilane

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Abstract

In this work, we report the first ring opening vapor to solid polymerization of cyclotrisiloxane and N-methyl-aza-2,2,4-trimethylsilacyclopentane by molecular layer deposition (MLD). This process was studied in situ with a quartz crystal microbalance and the thin film was characterized by X-ray photoelectron spectroscopy, ATR-FTIR and high-resolution transmission electron microscopy.

Graphical abstract: Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (V3D3) and azasilane

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Article information


Submitted
16 Jun 2020
Accepted
25 Jun 2020
First published
25 Jun 2020

Chem. Commun., 2020, Advance Article
Article type
Communication

Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (V3D3) and azasilane

K. Ashurbekova, K. Ashurbekova, I. Saric, E. Modin, M. Petravić, I. Abdulagatov, A. Abdulagatov and M. Knez, Chem. Commun., 2020, Advance Article , DOI: 10.1039/D0CC04195E

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