Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (V3D3) and azasilane

Kristina Ashurbekova; Karina Ashurbekova; Iva Saric; Evgenii Modin; Mladen Petravić; Ilmutdin Abdulagatov; Aziz Abdulagatov; Mato Knez

doi:10.1039/D0CC04195E

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Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (V₃D₃) and azasilane†

Kristina Ashurbekova,

*^a Karina Ashurbekova,^b Iva Saric,

^c Evgenii Modin,^b Mladen Petravić,^c Ilmutdin Abdulagatov,^a Aziz Abdulagatov^a and Mato Knez

*^bcd

Author affiliations

* Corresponding authors

^a Dagestan State University, Makhachkala 36700, Russian Federation
E-mail: krashurbekova@inbox.ru

^b CIC nanoGUNE, 20018 San Sebastian, Spain
E-mail: m.knez@nanogune.eu

^c Department of Physics and Centre for Micro- and Nanosciences and Technologies, University of Rijeka, 51000 Rijeka, Croatia

^d IKERBASQUE, Basque Foundation for Science, 48013 Bilbao, Spain

Abstract

In this work, we report the first ring opening vapor to solid polymerization of cyclotrisiloxane and N-methyl-aza-2,2,4-trimethylsilacyclopentane by molecular layer deposition (MLD). This process was studied in situ with a quartz crystal microbalance and the thin film was characterized by X-ray photoelectron spectroscopy, ATR-FTIR and high-resolution transmission electron microscopy.

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Article information

DOI: https://doi.org/10.1039/D0CC04195E
Article type: Communication
Submitted: 16 Jun 2020
Accepted: 25 Jun 2020
First published: 25 Jun 2020

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Chem. Commun., 2020,56, 8778-8781

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Molecular layer deposition of hybrid siloxane thin films by ring opening of cyclic trisiloxane (V₃D₃) and azasilane

K. Ashurbekova, K. Ashurbekova, I. Saric, E. Modin, M. Petravić, I. Abdulagatov, A. Abdulagatov and M. Knez, Chem. Commun., 2020, 56, 8778 DOI: 10.1039/D0CC04195E

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Chemical Communications