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Issue 9, 2020
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Thermal control of SZ2080 photopolymerization in four-beam interference lithography

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Abstract

Photopolymerization by four-beam interference lithography on a preheated SZ2080 sample was explored at different initial temperatures of the sample: 20 °C, 50 °C, 75 °C, 100 °C, 125 °C, and 150 °C, and at exposure times ranging from 0.5 s to 5 s. The average laser power selected was ∼100 mW for the 300 ps duration pulses at a 1 kHz repetition rate. The experimental results demonstrate that the higher initial temperature of the sample positively influences the crosslinking of the patterns. These findings will improve polymerization protocols for multi-beam interference lithography.

Graphical abstract: Thermal control of SZ2080 photopolymerization in four-beam interference lithography

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Article information


Submitted
19 Sep 2019
Accepted
10 Feb 2020
First published
19 Feb 2020

Phys. Chem. Chem. Phys., 2020,22, 5038-5045
Article type
Paper

Thermal control of SZ2080 photopolymerization in four-beam interference lithography

Ž. Prielaidas, S. Juodkazis and E. Stankevičius, Phys. Chem. Chem. Phys., 2020, 22, 5038
DOI: 10.1039/C9CP05168F

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