Issue 1, 2020

Sacrificial additive-assisted film growth endows self-powered CsPbBr3 photodetectors with ultra-low dark current and high sensitivity

Abstract

Inorganic halide perovskite CsPbBr3 is promising for stable, high-performance self-powered photodetectors (PDs). However, solution-processed polycrystalline CsPbBr3 films generally exhibit inferior photodetection performance in contrast to single-crystal and micro-/nano-structured counterparts, primarily because of their low carrier mobility and high defect density. We propose herein a sacrificial additive-assisted CsPbBr3 film growth strategy, in which a 2-phenylethanamine iodide (PEAI) additive was firstly introduced into a CsPbBr3 precursor film and then was extracted during CsPbBr3 film crystallization by high-temperature annealing. The as-obtained CsPbBr3 film exhibits multiple advantages of full coverage, pure phase, micro-sized grains, higher crystallinity, fewer defects, and particularly a CsBr-rich surface with less conductivity, compared with the control film prepared without PEAI sacrificial additive. The resulting self-powered PD with a simple configuration of FTO/TiO2/CsPbBr3/carbon yields an ultra-low dark current of 8.05 × 10−11 A cm−2, a high R of 0.35 A W−1, a superior D* of 3.83 × 1013 Jones, and a fast response time of 1.46 μs. These figures of merit are far beyond those of the one prepared with the control film and even most of self-powered CsPbBr3 PDs reported previously. Furthermore, the optimized PD exhibits excellent operational reliability and long-term stability in an ambient air atmosphere.

Graphical abstract: Sacrificial additive-assisted film growth endows self-powered CsPbBr3 photodetectors with ultra-low dark current and high sensitivity

Supplementary files

Article information

Article type
Paper
Submitted
02 Oct 2019
Accepted
12 Nov 2019
First published
14 Nov 2019

J. Mater. Chem. C, 2020,8, 209-218

Sacrificial additive-assisted film growth endows self-powered CsPbBr3 photodetectors with ultra-low dark current and high sensitivity

W. Zhu, M. Deng, D. Chen, D. Chen, H. Xi, J. Chang, J. Zhang, C. Zhang and Y. Hao, J. Mater. Chem. C, 2020, 8, 209 DOI: 10.1039/C9TC05403K

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements