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Controllable Growth of Vertically-oriented Graphene for High Sensitivity Gas Detection

Abstract

This paper sheds light on the effects of process parameters on a low-temperature growth of vertical graphene nano-petals (VGNPs) by plasma-assisted chemical vapor deposition (PACVD) at 550 oC without the presence of any catalyst or post-transfer treatment. The parameters include substrate temperature, plasma power and growth time. The significant influence of these variable parameters reveals the morphological evolution, growth rate and quality of VGNPs. Furthermore, the defect-guided growth mechanism of the VGNPs are discussed in detail. The as-grown VGNPs possess high hydrophobicity (water contact angle: 137o) due to unique physicochemical properties, ultra-high specific surface area, exposed sharp edges and non-stacking three-dimensional geometry. This study shows the methodology for optimizing the conditions to prepare VGNPs. A gas sensor exhibits superior sensitivity due to high specific surface area and a parts-per-trillion (ppt) level of NH3 detection capabilities which are directly manufactured on a SiO2 substrate with VGNPs. Moreover, Joule-heating expels molecules by physisorption from the vertical surface leading to fully-reversible and low-power operation. Our study may provide new insights for improved design of graphene-based sensing applications.

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Publication details

The article was accepted on 15 Apr 2019 and first published on 16 Apr 2019


Article type: Paper
DOI: 10.1039/C9TC01246J
Citation: J. Mater. Chem. C, 2019, Accepted Manuscript

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    Controllable Growth of Vertically-oriented Graphene for High Sensitivity Gas Detection

    J. Li, Z. Liu, Q. Guo, S. Yang, A. Xu, Z. Wang, G. Wang, Y. Wang, D. Chen and G. Ding, J. Mater. Chem. C, 2019, Accepted Manuscript , DOI: 10.1039/C9TC01246J

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