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Emerging Applications of Atomic Layer Deposition for the Rational Design of Novel Nanostructures for Surface Enhanced Raman Scattering

Abstract

Surface enhanced Raman scattering (SERS) has been recognized as an excellent spectroscopic technique for ultrasensitive and quantitative chemical/biochemical sensing applications. Generally, noble metal nanostructures (NMNs) contribute to the outstanding SERS performance due to their unique surface plasmon resonance properties. Single-molecular SERS detection could be possible through engineering of their plasmonic properties. However, due to lack of stability and reusability of NMNs, fabricating SERS active substrates with well-stabilized nanostructures, high sensitivity and reproducible SERS quantification is highly desirable but very challenging. Efforts are being carried out to fabricate SERS substrates with long term stability, higher sensitivity, and reproducibility in addition to their interdisciplinary applications. The nano-architecturing of novel functional materials using atomic layer deposition (ALD) technique has been emerged as an excellent tool for engineering novel nanostructures and tuning plasmonic properties of NMNs with atomic level precision under tunable synthesis conditions. This review reports on the development of novel, highly stable and ultrasensitive SERS substrates fabricated/assisted by ALD and their SERS applications in nanobiotechnology. The review also includes ALD surface chemistry, and reaction mechanisms of various functional materials (dielectric metal oxides and plasmonic materials) with special emphasis on the improvement of their physio-chemical and optical properties for SERS applications. In addition, various ways of utilizing ALD in designing robust and stable SERS substrates have been discussed. Eventually, the future prospects for ALD-synthesized SERS active substrates is discussed with emphasis on critical issues and real practical applications.

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Publication details

The article was accepted on 07 Jan 2019 and first published on 07 Jan 2019


Article type: Review Article
DOI: 10.1039/C8TC06299D
Citation: J. Mater. Chem. C, 2019, Accepted Manuscript
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    Emerging Applications of Atomic Layer Deposition for the Rational Design of Novel Nanostructures for Surface Enhanced Raman Scattering

    J. Prakash, H. C. Swart, G. Zhang and S. Sun, J. Mater. Chem. C, 2019, Accepted Manuscript , DOI: 10.1039/C8TC06299D

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