Issue 19, 2019

Strong interfacial coupling effects of ferroelectric polarization with two-dimensional electron gas in BaTiO3/MgO/AlGaN/GaN/Si heterostructures

Abstract

BaTiO3 (BTO)/MgO/GaN and BTO/MgO/AlGaN/GaN ferroelectric–semiconductor heterostructures with ultrathin MgO buffer layers were constructed by pulsed laser deposition, and an interfacial coupling mechanism between the ferroelectric polarization of BTO and two-dimensional electron gas (2DEG) at the AlGaN/GaN interface was explored for enhancement-mode high electron mobility transistors (HEMTs). The upward ferroelectric self-polarization characteristic of BTO integrated on GaN and AlGaN/GaN was induced by the suspect space-charge region at the BTO/GaN interface, which was directly confirmed by piezoresponse force microscopy. Thus, the 2DEG density at the AlGaN/GaN interface was spontaneously reduced by the ferroelectric field effect of BTO with upward polarization, and the threshold voltage was prominently increased to −0.4 V. More significantly, interfacial coupling correlation between the ferroelectric polarization state and 2DEG was established. Via modulating the ferroelectric polarization state of BTO, continuous regulation of the threshold voltage from −0.4 V to +3.2 V and a large counter-clockwise memory window of 2.2 V were demonstrated. A BTO/MgO/AlGaN/GaN heterostructure could be a promising candidate for GaN-based enhancement-mode HEMTs and non-volatile memory devices.

Graphical abstract: Strong interfacial coupling effects of ferroelectric polarization with two-dimensional electron gas in BaTiO3/MgO/AlGaN/GaN/Si heterostructures

Supplementary files

Article information

Article type
Paper
Submitted
18 Nov 2018
Accepted
05 Apr 2019
First published
08 Apr 2019

J. Mater. Chem. C, 2019,7, 5677-5685

Strong interfacial coupling effects of ferroelectric polarization with two-dimensional electron gas in BaTiO3/MgO/AlGaN/GaN/Si heterostructures

G. Li, X. Li, J. Zhao, Q. Zhu and Y. Chen, J. Mater. Chem. C, 2019, 7, 5677 DOI: 10.1039/C8TC05795H

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