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Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications

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Abstract

The investigation of the photoionization processes of a series of titanium oxo clusters evidenced that doping their organic shell with extended aromatic structures decreases their ionization energy and stabilises the resulting radical cations. Such tunability of their photochemistry arising from ligand exchange gives these hybrid compounds great potential as EUV photoresists.

Graphical abstract: Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications

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Publication details

The article was received on 18 Oct 2018, accepted on 28 Nov 2018 and first published on 04 Dec 2018


Article type: Communication
DOI: 10.1039/C8TC05273E
Citation: J. Mater. Chem. C, 2019, Advance Article
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    Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications

    L. Wu, M. Tiekink, A. Giuliani, L. Nahon and S. Castellanos, J. Mater. Chem. C, 2019, Advance Article , DOI: 10.1039/C8TC05273E

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