Jump to main content
Jump to site search


Unique chemistries of metal-nitrate precursors to form metal-oxide thin films from solution: materials for electronic and energy applications

Author affiliations

Abstract

Metal-oxide thin films are used extensively in electronic and energy applications. Solution processing offers a potentially scalable and inexpensive deposition method to expand the applications of metal-oxide films and to complement vacuum-deposition techniques. Among precursors for solution deposition, metal nitrates stand out for their ability to form high-quality metal-oxide thin films. This review focuses on unique aspects of metal-nitrate chemistry that have been exploited to advance the development of solution-processed thin films. We discuss the solid-state bulk, solution, and thin-film chemical reactions involving metal nitrates and illustrate how the resulting metal-oxide thin-film properties depend on the entire reaction pathway. To conclude, we offer perspective as to how understanding the chemistry of film formation from metal-nitrate precursors is useful for addressing the primary drivers for industrial manufacturing of solution-processed metal-oxide thin films.

Graphical abstract: Unique chemistries of metal-nitrate precursors to form metal-oxide thin films from solution: materials for electronic and energy applications

Back to tab navigation

Publication details

The article was received on 17 Jul 2019, accepted on 23 Sep 2019 and first published on 23 Sep 2019


Article type: Review Article
DOI: 10.1039/C9TA07727H
J. Mater. Chem. A, 2019, Advance Article

  •   Request permissions

    Unique chemistries of metal-nitrate precursors to form metal-oxide thin films from solution: materials for electronic and energy applications

    E. A. Cochran, K. N. Woods, D. W. Johnson, C. J. Page and S. W. Boettcher, J. Mater. Chem. A, 2019, Advance Article , DOI: 10.1039/C9TA07727H

Search articles by author

Spotlight

Advertisements