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Facile fabrication of an F-POSS polymer based liquid-repellent Cu mesh with excellent durability and self-cleaning performance

Abstract

A facile method that combines alkali-assisted oxidation and -SH chelation with click chemistry reaction is employed to create an F-POSS polymer surface (fluorinated Octavinyl Polyhedral Oligomeric Silsesquioxane polymer) based Cu mesh (F-POSS-OM). The prepared F-POSS-OM surface displays cohering hierarchical nano-F-POSS polymer granules/micro-Cu(OH)2 wires structure, which provides re-entrant geometry needed for liquid-repellency and low liquids sliding angles (<15°). Meanwhile, the easy-prepared structure endows the F-POSS-OM with remarkable durability to mechanical and chemical damages including wear abrasion, tape-peeling, 100 cm-height hammer impact, severe hand twisting, strong acid/ base/salt solution, and high temperature. Importantly, F-POSS-OM still retains excellent self-cleaning performance even after being subjected to these damages.

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Publication details

The article was received on 29 Aug 2019, accepted on 28 Oct 2019 and first published on 30 Oct 2019


Article type: Paper
DOI: 10.1039/C9SM01748H
Soft Matter, 2019, Accepted Manuscript

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    Facile fabrication of an F-POSS polymer based liquid-repellent Cu mesh with excellent durability and self-cleaning performance

    G. Luo, L. Wang, X. Li, K. Yang, L. Yongle, S. xu, P. Pi and X. Wen, Soft Matter, 2019, Accepted Manuscript , DOI: 10.1039/C9SM01748H

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