Jump to main content
Jump to site search
PLANNED MAINTENANCE Close the message box

Scheduled maintenance work on Wednesday 22nd May 2019 from 11:00 AM to 1:00 PM (GMT).

During this time our website performance may be temporarily affected. We apologise for any inconvenience this might cause and thank you for your patience.



Dependence of the fluorination intercalation of graphene toward high-quality fluorinated graphene formation

Author affiliations

Abstract

A direct gas–solid reaction between fluorine gas (F2) and graphene is expected to become an inexpensive, continuous and scalable production method to prepare fluorinated graphene. However, the dependence of the fluorination intercalation of graphene is still poorly understood, which prevents the formation of high-quality fluorinated graphene. Herein, we demonstrate that chemical defects (oxygen group defects) on graphene sheets play a leading role in promoting fluorination intercalation, whereas physical defects (point defects), widely considered to be an advantage due to more diffusion channels for F2, were not influential. Tracing the origins, compared with the point defects, the unstable hydroxyl and epoxy groups produced active radicals and the relatively stable carbonyl and carboxyl groups activated the surrounding aromatic regions, thereby both facilitating fluorination intercalation, and the former was a preferential and easier route. Based on the above investigations, we successfully prepared fluorinated graphene with an ultrahigh interlayer distance (9.7 Å), the largest value reported for fluorinated graphene, by customizing graphene with more hydroxyl and epoxy groups. It presented excellent self-lubricating ability, with an ultralow interlayer interaction of 0.056 mJ m−2, thus possessing a far lower friction coefficient compared with graphene, when acting as a lubricant. Moreover, it was also easy to exfoliate by shearing, due to the diminutive interlayer friction and eliminated commensurate stacking. The exfoliated number of layers of less than three exceeded 80% (monolayer rate ≈ 40%), and no surfactant was applied to prevent further stacking.

Graphical abstract: Dependence of the fluorination intercalation of graphene toward high-quality fluorinated graphene formation

Back to tab navigation

Supplementary files

Publication details

The article was received on 26 Feb 2019, accepted on 29 Apr 2019 and first published on 30 Apr 2019


Article type: Edge Article
DOI: 10.1039/C9SC00975B
Chem. Sci., 2019, Advance Article
  • Open access: Creative Commons BY-NC license
  •   Request permissions

    Dependence of the fluorination intercalation of graphene toward high-quality fluorinated graphene formation

    K. Fan, J. Fu, X. Liu, Y. Liu, W. Lai, X. Liu and X. Wang, Chem. Sci., 2019, Advance Article , DOI: 10.1039/C9SC00975B

    This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence. Material from this article can be used in other publications provided that the correct acknowledgement is given with the reproduced material and it is not used for commercial purposes.

    Reproduced material should be attributed as follows:

    • For reproduction of material from NJC:
      [Original citation] - Published by The Royal Society of Chemistry (RSC) on behalf of the Centre National de la Recherche Scientifique (CNRS) and the RSC.
    • For reproduction of material from PCCP:
      [Original citation] - Published by the PCCP Owner Societies.
    • For reproduction of material from PPS:
      [Original citation] - Published by The Royal Society of Chemistry (RSC) on behalf of the European Society for Photobiology, the European Photochemistry Association, and RSC.
    • For reproduction of material from all other RSC journals:
      [Original citation] - Published by The Royal Society of Chemistry.

    Information about reproducing material from RSC articles with different licences is available on our Permission Requests page.

Search articles by author

Spotlight

Advertisements