Issue 71, 2019, Issue in Progress

Schottky anomaly and Néel temperature treatment of possible perturbed hydrogenated AA-stacked graphene, SiC, and h-BN bilayers

Abstract

In this paper, the potential of engineering and manipulating the electronic heat capacity and Pauli susceptibility of pristine and perturbed hydrogenated AA-stacked graphene, SiC (silicon carbide), and h-BN (hexagonal boron nitride) bilayers is studied using a designed transverse Zeeman magnetic field and the dilute charged impurity. The tight-binding Hamiltonian model, the Born approximation and the Green’s function method describe the carrier dynamics up to a certain degree. The unperturbed results show that the heat capacity and susceptibility of all bilayers increase with different hydrogenation doping configurations. We also found that the maximum heat capacity and susceptibility relates to the chair-like and table-like configurations. Also, the graphene possesses the highest activity compared to SiC and h-BN lattices due to its zero on-site energies. For the Zeeman magnetic field-induced Schottky anomaly and the Néel temperature corresponding to the maximum electronic heat capacity, EHCMax., and Pauli spin paramagnetic susceptibility, PSPSMax., respectively, the pristine EHCMax. (PSPSMax.) decreases (increases) with the Zeeman field. On the other hand, the corresponding results for reduced table-like and reduced chair-like lattices illustrate that both EHCMax. and PSPSMax. decrease with the Zeeman field, on average. However, under the influence of the dilute charged impurity, the pristine EHCMax. of graphene (SiC and h-BN) decreases (increases) with impurity concentration for all configurations while the corresponding PSPSMax. fluctuates (decreases) for the pristine (reduced table-like and reduced chair-like) case. These findings introduce hydrogenated AA-stacked bilayers as versatile candidates for real applications.

Graphical abstract: Schottky anomaly and Néel temperature treatment of possible perturbed hydrogenated AA-stacked graphene, SiC, and h-BN bilayers

Article information

Article type
Paper
Submitted
16 Oct 2019
Accepted
20 Nov 2019
First published
16 Dec 2019
This article is Open Access
Creative Commons BY-NC license

RSC Adv., 2019,9, 41569-41580

Schottky anomaly and Néel temperature treatment of possible perturbed hydrogenated AA-stacked graphene, SiC, and h-BN bilayers

B. D. Hoi, L. T. T. Phuong, V. T. Lam, D. Q. Khoa, T. Tien, N. T. T. Binh, H. V. Phuc, N. N. Hieu and C. V. Nguyen, RSC Adv., 2019, 9, 41569 DOI: 10.1039/C9RA08446K

This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence. You can use material from this article in other publications, without requesting further permission from the RSC, provided that the correct acknowledgement is given and it is not used for commercial purposes.

To request permission to reproduce material from this article in a commercial publication, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party commercial publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements