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Hierarchical patterns with sub-20 nm pattern fidelity via block copolymer self-assembly and soft nanotransfer printing

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Abstract

We describe the development of a technique to transfer micrometer patterns of organic thin films with sub-50 nm edge resolution and sub-20 nm pattern fidelity. Large-area transfer of homopolymers, diblock copolymers, and small molecules films is demonstrated, and extended to multitudes of different shapes. Moreover, this technique is amenable to sequential printing (i.e. multilayer stacking) and can be integrated with 2D atomic crystals. This high-fidelity pattern transfer work has broad scope for potential uses from the construction of van der Waals heterostructures interfaced with self-assembled block copolymer thin films to the development of platforms to investigate the influence of hierarchical patterning on cell differentiation.

Graphical abstract: Hierarchical patterns with sub-20 nm pattern fidelity via block copolymer self-assembly and soft nanotransfer printing

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Publication details

The article was received on 01 Mar 2019, accepted on 10 May 2019 and first published on 17 May 2019


Article type: Paper
DOI: 10.1039/C9PY00335E
Polym. Chem., 2019, Advance Article

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    Hierarchical patterns with sub-20 nm pattern fidelity via block copolymer self-assembly and soft nanotransfer printing

    H. Tran, H. M. Bergman, K. R. Parenti, A. M. van der Zande, C. R. Dean and L. M. Campos, Polym. Chem., 2019, Advance Article , DOI: 10.1039/C9PY00335E

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