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Issue 8, 2019
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Ultra-low volume oxygen tolerant photoinduced Cu-RDRP

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We introduce the first oxygen tolerant ultra-low volume (as low as 5 μL total reaction volume) photoinduced copper-RDRP of a wide range of hydrophobic, hydrophilic and semi-fluorinated monomers including lauryl and hexyl acrylate, poly(ethylene glycol methyl ether acrylate) and trifluoroethyl (meth)acrylates. In the absence of any external deoxygenation, well-defined homopolymers can be obtained with low dispersity values, high end-group fidelity and near-quantitative conversions. Block copolymers can be efficiently synthesized in a facile manner and the compatibility of the system to larger scale polymerizations (up to 0.5 L) is also demonstrated by judiciously optimizing the reaction conditions. Importantly, the online monitoring of oxygen consumption was also conducted through an oxygen probe and the role of each component is identified and discussed.

Graphical abstract: Ultra-low volume oxygen tolerant photoinduced Cu-RDRP

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The article was received on 04 Dec 2018, accepted on 14 Jan 2019 and first published on 14 Jan 2019

Article type: Paper
DOI: 10.1039/C8PY01720D
Citation: Polym. Chem., 2019,10, 963-971

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    Ultra-low volume oxygen tolerant photoinduced Cu-RDRP

    E. Liarou, A. Anastasaki, R. Whitfield, C. E. Iacono, G. Patias, N. G. Engelis, A. Marathianos, G. R. Jones and D. M. Haddleton, Polym. Chem., 2019, 10, 963
    DOI: 10.1039/C8PY01720D

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