Issue 8, 2019

Ultra-low volume oxygen tolerant photoinduced Cu-RDRP


We introduce the first oxygen tolerant ultra-low volume (as low as 5 μL total reaction volume) photoinduced copper-RDRP of a wide range of hydrophobic, hydrophilic and semi-fluorinated monomers including lauryl and hexyl acrylate, poly(ethylene glycol methyl ether acrylate) and trifluoroethyl (meth)acrylates. In the absence of any external deoxygenation, well-defined homopolymers can be obtained with low dispersity values, high end-group fidelity and near-quantitative conversions. Block copolymers can be efficiently synthesized in a facile manner and the compatibility of the system to larger scale polymerizations (up to 0.5 L) is also demonstrated by judiciously optimizing the reaction conditions. Importantly, the online monitoring of oxygen consumption was also conducted through an oxygen probe and the role of each component is identified and discussed.

Graphical abstract: Ultra-low volume oxygen tolerant photoinduced Cu-RDRP

Supplementary files

Article information

Article type
04 Dec 2018
14 Jan 2019
First published
14 Jan 2019
This article is Open Access
Creative Commons BY license

Polym. Chem., 2019,10, 963-971

Ultra-low volume oxygen tolerant photoinduced Cu-RDRP

E. Liarou, A. Anastasaki, R. Whitfield, C. E. Iacono, G. Patias, N. G. Engelis, A. Marathianos, G. R. Jones and D. M. Haddleton, Polym. Chem., 2019, 10, 963 DOI: 10.1039/C8PY01720D

This article is licensed under a Creative Commons Attribution 3.0 Unported Licence. You can use material from this article in other publications without requesting further permissions from the RSC, provided that the correct acknowledgement is given.

Read more about how to correctly acknowledge RSC content.

Social activity