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Issue 17, 2019
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Hierarchical multi-level block copolymer patterns by multiple self-assembly

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Uniform, well-ordered sub-20 nm patterns can be generated by the templated self-assembly of block copolymers (BCPs) with a high Flory–Huggins interaction parameter (χ). However, the self-assembled BCP monolayers remain limited in the possible structural geometries. Here, we introduce a multiple self-assembly method which uses di-BCPs to produce diverse morphologies, such as dot, dot-in-honeycomb, line-on-dot, double-dot, pondering, dot-in-pondering, and line-on-pondering patterns. To improve the diversity of BCP morphological structures, we employed sphere-forming and cylinder-forming poly(styrene-block-dimethylsiloxane) (PS-b-PDMS) BCPs with a high χ. The self-assembled mono-layer and double-layer SiOx dot patterns were modified at a high temperature (∼800 °C), showing hexagonally arranged (dot) and double-hexagonally arranged (pondering) SiOx patterns, respectively. We successfully obtained additional new nanostructures (big-dot, dot-in-honeycomb, line-on-dot, pondering, dot-in-pondering, and line-on-pondering types) through a second self-assembly of cylinder-forming BCPs using the dot and pondering patterns as guiding templates. This simple approach can likely be extended to the multiple self-assembly of many other BCPs with good functionality, significantly contributing to the development of various nanodevices.

Graphical abstract: Hierarchical multi-level block copolymer patterns by multiple self-assembly

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Publication details

The article was received on 25 Jan 2019, accepted on 29 Mar 2019 and first published on 01 Apr 2019

Article type: Paper
DOI: 10.1039/C9NR00774A
Nanoscale, 2019,11, 8433-8441

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    Hierarchical multi-level block copolymer patterns by multiple self-assembly

    H. Jung, W. H. Shin, T. W. Park, Y. J. Choi, Y. J. Yoon, S. H. Park, J. Lim, J. Kwon, J. W. Lee, S. Kwon, G. H. Seong, K. H. Kim and W. I. Park, Nanoscale, 2019, 11, 8433
    DOI: 10.1039/C9NR00774A

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