Issue 43, 2019

Investigation of the kinetics and mechanism of Z-scheme Ag3PO4/WO3 p–n junction photocatalysts with enhanced removal efficiency for RhB

Abstract

Semiconductor-based photocatalysis attracts wide attention owing to its ability to directly utilize solar energy for the production of solar fuels. In particular, the construction of Z-scheme heterojunctions is demonstrated to benefit the photocatalytic performance because of the separation and transfer of the photogenerated charge carriers and well-preserved strong redox ability. In this work, a series of Z-scheme Ag3PO4/WO3 p–n junction photocatalysts were prepared employing a facile impregnation method. The photocatalysts (Ag3PO4/WO3 p–n junction) presented enhanced photo-degradation efficiency; for example, with AW-45, 99.9% degradation could be obtained for RhB (30 ppm) on irradiation (λ > 420 nm, 350 W xenon lamp) for 7 min, which is a great improvement compared with the individual constituents. The degradation rate for AW-45 was 27 times higher than that of a commercial powder (P25). The apparent kinetic rate of catalytic degradation was obtained according to the results from the degradation process. The mechanism for electron transfer between Ag3PO4 and WO3 was also investigated. The reduction and oxidation processes concentrated on the CB (conducting band) of Ag3PO4 and the VB (valence band) of WO3, resulting in promoting the mechanism for photocatalytic degradation in the Z-scheme Ag3PO4/WO3 p–n junction photocatalysts.

Graphical abstract: Investigation of the kinetics and mechanism of Z-scheme Ag3PO4/WO3 p–n junction photocatalysts with enhanced removal efficiency for RhB

Supplementary files

Article information

Article type
Paper
Submitted
23 Aug 2019
Accepted
09 Oct 2019
First published
10 Oct 2019

New J. Chem., 2019,43, 17104-17115

Investigation of the kinetics and mechanism of Z-scheme Ag3PO4/WO3 p–n junction photocatalysts with enhanced removal efficiency for RhB

L. You, M. Gao, T. Li, L. Guo, P. Chen and M. Liu, New J. Chem., 2019, 43, 17104 DOI: 10.1039/C9NJ04369A

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