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Hybrid line-dot nanopatterns from directed self-assembly of diblock copolymers by trenches

Abstract

We demonstrate that the directed self-assembly of AB diblock copolymers by periodic trenches can be used to fabricate large-scale ordered hybrid line-dot nanopatterns in addition to the defect-free dot nanopattern. The formation of line or dot nanopattern in thin films with proper surface affinities is controlled by the film thickness that is modulated by the topographic pattern consisting of steps and trenches. Two kinds of line-dot nanopatterns are achieved with cylinder-forming and sphere-forming copolymers, respectively. One kind of hybrid nanopatterns is composed of perpendicularly standing cylinders (dots) on the steps and parallel monolayer cylinders (lines) within the trenches, while the dots of the other kind are replaced by the monolayer spheres on the steps. The thermodynamic stability region of target hybrid nanopatterns is identified by constructing two-dimensional phase diagrams with respect to two control parameters of step height and film thickness using self-consistent field theory. Furthermore, a process window of the line-dot nanopatterns is estimated using cell dynamics simulations based on time-dependent Ginzburg-Landau theory, confirming their feasibility in kinetics.

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Publication details

The article was received on 17 Feb 2019, accepted on 14 Apr 2019 and first published on 15 Apr 2019


Article type: Paper
DOI: 10.1039/C9CP00949C
Citation: Phys. Chem. Chem. Phys., 2019, Accepted Manuscript

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    Hybrid line-dot nanopatterns from directed self-assembly of diblock copolymers by trenches

    W. Zhao, C. Duan and W. Li, Phys. Chem. Chem. Phys., 2019, Accepted Manuscript , DOI: 10.1039/C9CP00949C

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