This website uses cookies to give you the best user experience. If you continue without changing your settings we'll assume you are happy to receive all RSC cookies. You can change your cookie settings by navigating to our Privacy and Cookies page and following the instructions. These instructions are also obtainable from the privacy link at the bottom of any RSC page.
Lite Version|Standard version
Home > Chemical Communications >
To gain access to this content please
Log in via your home Institution.
Log in with your member or subscriber username and password.
Download


Buy PDF Add PDF to Basket (£42.50*)
*Exclusive of taxes
This article contains 4 page(s)
Abstract | Cited by

Ar&H2 plasma treatment was proposed to enhance the response of a p-CuAlO2 sensor toward volatile organic compounds. Comprehensive defect characterization studies indicate a substantial increase of surface unsaturated oxygen vacancy (VO) defects via plasma treatment, which could provide active sites for molecule adsorption and the subsequent interfacial redox reaction.

Graphical abstract: Surface oxygen vacancy defect engineering of p-CuAlO2via Ar&H2 plasma treatment for enhancing VOCs sensing performances

Page: ^ Top


Enter Keywords, author, title,reference, or DOI
Log in | Register