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Influence of boron doping on the dynamics of formation of Os metal nanoclusters on graphitic surfaces

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Abstract

The fabrication of osmium nanoclusters from single atoms has been studied in real-time on B-doped and B-free graphitic surfaces. The dynamics of nucleation on both surfaces are identified, captured, and reported. The nucleation is ca. 2× faster on B-doped surface compared to the B-free surface (38 pm min−1 versus 18 pm min−1), suggesting osmium–boron interactions within the nanomaterials.

Graphical abstract: Influence of boron doping on the dynamics of formation of Os metal nanoclusters on graphitic surfaces

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Publication details

The article was received on 11 Mar 2019, accepted on 29 Apr 2019 and first published on 07 May 2019


Article type: Communication
DOI: 10.1039/C9CC01974J
Chem. Commun., 2019, Advance Article

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    Influence of boron doping on the dynamics of formation of Os metal nanoclusters on graphitic surfaces

    A. Pitto-Barry and N. P. E. Barry, Chem. Commun., 2019, Advance Article , DOI: 10.1039/C9CC01974J

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