Jump to main content
Jump to site search
Access to RSC content Close the message box

Continue to access RSC content when you are not at your institution. Follow our step-by-step guide.


Issue 21, 2019
Previous Article Next Article

Introducing the concept of pulsed vapor phase copper-free surface click-chemistry using the ALD technique

Author affiliations

Abstract

We report for the first time on a pulsed vapor phase copper-free azide–alkyne click reaction on ZnO by using the atomic layer deposition (ALD) process technology. This reproducible and fast method is based on an in situ two-step reaction consisting of sequential exposures of ZnO to propiolic acid and benzyl azide.

Graphical abstract: Introducing the concept of pulsed vapor phase copper-free surface click-chemistry using the ALD technique

Back to tab navigation

Supplementary files

Article information


Submitted
15 Jan 2019
Accepted
13 Feb 2019
First published
13 Feb 2019

Chem. Commun., 2019,55, 3109-3112
Article type
Communication

Introducing the concept of pulsed vapor phase copper-free surface click-chemistry using the ALD technique

I. Saric, R. Peter, M. Kolympadi Markovic, I. Jelovica Badovinac, C. Rogero, M. Ilyn, M. Knez and G. Ambrožić, Chem. Commun., 2019, 55, 3109
DOI: 10.1039/C9CC00367C

Social activity

Search articles by author

Spotlight

Advertisements