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Issue 21, 2019
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Introducing the concept of pulsed vapor phase copper-free surface click-chemistry using the ALD technique

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Abstract

We report for the first time on a pulsed vapor phase copper-free azide–alkyne click reaction on ZnO by using the atomic layer deposition (ALD) process technology. This reproducible and fast method is based on an in situ two-step reaction consisting of sequential exposures of ZnO to propiolic acid and benzyl azide.

Graphical abstract: Introducing the concept of pulsed vapor phase copper-free surface click-chemistry using the ALD technique

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Publication details

The article was received on 15 Jan 2019, accepted on 13 Feb 2019 and first published on 13 Feb 2019


Article type: Communication
DOI: 10.1039/C9CC00367C
Citation: Chem. Commun., 2019,55, 3109-3112

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    Introducing the concept of pulsed vapor phase copper-free surface click-chemistry using the ALD technique

    I. Saric, R. Peter, M. Kolympadi Markovic, I. Jelovica Badovinac, C. Rogero, M. Ilyn, M. Knez and G. Ambrožić, Chem. Commun., 2019, 55, 3109
    DOI: 10.1039/C9CC00367C

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