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Issue 11, 2019
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Reactive block copolymers for patterned surface immobilization with sub-30 nm spacing

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Abstract

Phase-segregating block copolymers are powerful platforms for nanofabrication, particularly when employed as lithographic mask precursors. Surface-reactive polymeric films with distinct sub-30 nm domains are also proposed as covalent docking platforms for scalable, high-resolution molecular patterned immobilization. Here, the well-known self-assembling polystyrene-block-polyisoprene system is the starting point to produce a small library of derivatives with distinct reactive pendant groups (halide, azide, pentafluorophenylalkyl) by nitroxide-mediated radical polymerization. We find that controlling film thickness is crucial to obtain a perpendicular lamellar morphology and that the presence of the functional groups has a limited impact on self-assembly, yet may influence characteristic domain dimensions. Differential scanning calorimetry (DSC), small-angle X-ray scattering (SAXS), and atomic force microscopy (AFM) are utilized in concert to assess the phase behavior of the polymers and the surface features of the nanostructures. As a proof-of-concept for the surface reactivity, click chemistry-driven immobilization of a model water-soluble polymer is evidenced by X-ray photoelectron spectroscopy (XPS) and preservation of the underlying morphology is investigated by AFM.

Graphical abstract: Reactive block copolymers for patterned surface immobilization with sub-30 nm spacing

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Publication details

The article was received on 14 Dec 2018, accepted on 28 Jan 2019 and first published on 29 Jan 2019


Article type: Paper
DOI: 10.1039/C8PY01777H
Polym. Chem., 2019,10, 1344-1356
  • Open access: Creative Commons BY-NC license
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    Reactive block copolymers for patterned surface immobilization with sub-30 nm spacing

    H. Turgut, N. Dingenouts, V. Trouillet, P. Krolla-Sidenstein, H. Gliemann and G. Delaittre, Polym. Chem., 2019, 10, 1344
    DOI: 10.1039/C8PY01777H

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