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Issue 6, 2019
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Doping of thiolate protected gold clusters through reaction with metal surfaces

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Abstract

A new technique is introduced for doping gold nanoclusters by using a metal surface such as Ag, Cu and Cd as a source of heteroatoms. The importance of the thiol ligand in the doping process is examined by following the reactions with MALDI-TOF mass spectrometry in the presence and the absence of the thiols on the surface. The doping reactions depend greatly on the type of the cluster and the availability of the ligand which is a crucial element for alloying. The thiol acts as a messenger exchanging the metal atoms between the cluster and the metal surface as revealed by the XPS studies performed on the metal surfaces.

Graphical abstract: Doping of thiolate protected gold clusters through reaction with metal surfaces

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Supplementary files

Article information


Submitted
14 Nov 2018
Accepted
22 Jan 2019
First published
23 Jan 2019

This article is Open Access

Nanoscale, 2019,11, 2938-2945
Article type
Paper

Doping of thiolate protected gold clusters through reaction with metal surfaces

R. Kazan, U. Müller and T. Bürgi, Nanoscale, 2019, 11, 2938
DOI: 10.1039/C8NR09214A

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